心术
台积电 2nm 预计 2025 年量产,业界看好其领先三星和英特尔_iPhone15或使用台积电3nm芯片_技术论坛_我的网站

A | Post the global success of Pushpa, Allu Arjun has been treading a cautious path! The icon star, as he’s fondly called by his fans, has been circumspect about his subsequent moves. After a lot of dilly-dallying, Allu Arjun zeroed in on Atlee’s sci-fi thriller which the actor has been shooting for in Mumbai. While the shooting is mid-way, reports about his next film have been doing the rounds. Allu Arjun yet to finalize Allu Arjun intends to complete his film with Atlee by 2026 summer, and take his next film on floors by end of that year. As part of the reports have emerged that he had zeroed in on director Lokesh Kanagaraj. But the truth of the matter is that he has been in discussion with as many as five top directors – Sanjay Leela Bhansali to Prashanth Neel to Nelson Dilipkumar, Basil Joseph and Lokesh Kanagaraj – all of them have met and narrated storylines to Allu Arjun. According to sources close to the actor, he had not finalized any director yet. “Allu Arjun wanted to do stories that have universal appeal; his idea is to expand fanbase in various countries by approving scripts that attract the hinterland. Although he is excited with story ideas of a couple of directors, he wanted to give himself some time to finalize. He hasn’t signed any film yet, but intends to take it up close to wrapping up the shooting for Atlee’s large-scale, pan-Indian science-fiction action-fantasy film – that way he gets a perfect picture on his mounting appeal.” Global collaborations Allu Arjun has been very ambitious about collaborating with global technicians for his films. Teaming up with Studios in the West for VFX and roping in choreographers and artists from the South-East for Atlee’s film indicates his aspirations for wider appeal. Also Read: Allu Arjun or Pawan Kalyan? Logesh Kanagaraj Keeps Fans Guessing。

B | 台积电先进制程进展顺利,3nm 将在今年下半年量产,升级版 3nm(N3E)制程将于 3nm 量产一年后量产,即 2023 年量产,2nm 预计于 2025 年量产。台积电 2nm 厂将落地竹科宝山二期扩建计划,“竹科管理局”已展开公共设施建设,台积电 2nm 厂也开始进行整地作业。台积电 2nm 首次采用纳米片架构,相较 N3E 制程,在相同功耗下频率可提升 10% 至 15%。在相同频率下,功耗降低 25% 至 30%。台积电总裁魏哲家日前在技术论坛中强调,台积电 2nm 将会是密度最优、效能最好的技术。市场也看好,台积电 2nm 进度将领先对手三星及英特尔。IT之家了解到,此前消息称,虽然在 3nm 世代略有保守,但无论如何,鳍片 (Fin) 宽度都已经接近实际极限,再向下就会遇到瓶颈,所以外资法人预估台积电 2nm 先进制程将采用环绕式闸极场效电晶体 GAAFET 高端架构生产 2nm 芯片。返回搜狐,查看更多责任编辑:
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